KNT-Scientific-Publications

Pattern transfer of a 23 nm-period grating and sub-15 nm dots into CVD diamond

We have made 23 nm period gratings (11.5 nm 1:1 lines and spaces) on diamond substrates using hydrogen silsesquioxane (HSQ) as a resist for electron beam lithography. Reactive ion etching (O2 plasma) is used to transfer high resolution patterns to the diamond substrate with HSQ serving as a mask. We believe this to be the shortest period grating defined by electron beam lithography.

Lister, K. A., Casey, B. G., Dobson, P. S., Thoms, S., Macintyre, D. S., Wilkinson, C. D. W., & Weaver, J. M. R. (2004). Pattern transfer of a 23 nm-period grating and sub-15 nm dots into CVD diamond. Microelectronic engineering, 73, 319-322.
https://doi.org/10.1016/j.mee.2004.02.060

Share this post

Share on facebook
Share on twitter
Share on linkedin
Share on google
Share on pinterest
Share on print
Share on email
OFC-2019
News & Events

OFC Conference 2019

The Optical Networking and Communication Conference & Exhibition is the largest global conference and exhibition for optical communications, held in the San

Read More »

How can we help you to bring your project together?