The JWNC continues to receive significant financial support from the University of Glasgow growing the technical capability in key areas. In the past year, an Oxford Instruments ICP180 plasma etch tool designed for III-V etching, a multi-source plassys electron beam evaporator, a chemical mechanical polisher and wafer scriber have been installed. Funds have been secured through a recent capex bid to build on the existing dry etch and lithography capability within the centre. New equipment due to arrive mid-2013 include a deep silicon ICP etch tool and laser lithography system.
Installation of New Equipment
Share this post
Connect with us
Stay informed of our latest innovations, sign up to our newsletter.